In Situ Interface Control of Pseudomorphic InAs/InP Quantum Well Structure Growth by Surface Photo-Absorption
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概要
- 論文の詳細を見る
The exchange reaction of group V atoms was monitored in situ by surface photo-absorption on a submonolayer scale during metalorganic vapor phase epitaxial growth of pseudomorphic InAs/InP heterostructure on (001) InP substrates. About a 0.4-monolayer As/P exchange reaction was observed after arsine was supplied at 0.2 μmol/s onto the In surface of InP at a substrate temperature (T_s) of 400℃. At a T_s of 350℃, this As/P exchange reaction was suppressed to less than 0.1 monolayer. In contrast, the P/As exchange reaction was less than 0.1 monolayer below 400℃. The benefits of in situ control were shown by growing pseudomorphic InAs/InP single and multiple quantum wells with 1-12 InAs well layers at T_s=350℃ and characterizing them by cross sectional transmission electron microscopy, photoluminescence, and double crystal X-ray diffraction. Metallurgically abrupt and atomically flat heterostructures without dislocations were grown up to 10 monolayer (ML) of InAs well, which corresponds to the critical layer thickness.
- 社団法人応用物理学会の論文
- 1992-12-15
著者
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KOBAYASHI Naoki
NTT Basic Research Laboratories
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Kobayashi Yasuyuki
Ntt Basic Research Laboratories
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Kobayashi Naoki
Ntt Basic Laboratories Ntt Corporation
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