High Rate Sputtering of Corrosion-Resistant Alloys(Welding Physics, Processes & Instruments)
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概要
- 論文の詳細を見る
High corrosion-resitant films of amorphous Fe_<80-x>Cr_xP_<13>C_7, Fe_<45>Cr_<30>Mo_5P_<13>C_7, Cr_<70>C_<30>, Cr_<75>B_<25> and Ti_<75>B_<25> were deposited by dc-triode sputtering on water-cooled copper substrate. X-ray diffractometry showed a few diffraction patterns that characterize the amorphous structure for deposited films. High sputtering rate of about 0.1μm/min was achieved by appling high ion current densities to the sputtering target under 10^<-2> Torr of Ar gas. The high dense Ar plasma ions were produced using a plasma generator. The microhardness of amorphous Cr_<70>C_<30>, Cr_<75>B_<25> and Ti_<75>B_<25> were 1288, 1168 and 1081, respectively. The films, which contain high corrosion resitant alloying elements such as Cr and Ti, show extremely high corrosion resistance, particularly pitting corrosion resitance in IN HCI. The high corrosion resistance of these films is attributable to the enrichment of Cr and Ti in the passive films.
- 大阪大学の論文
著者
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Okamoto Ikuo
Osaka University
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NAKA Masaaki
Osaka University
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FUJIMORI Hiroyasu
The Research Institute for Iron, Steel and Other Metals, Tohoku University
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Naka Masaaki
Welding Research Institute Of Osaka University
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Okamoto Ikuo
Welding Research Institute Of Osaka University
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Hanada Shuji
The Research Institute For Iron Steel And Other Metals Tohoku University
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Hanada Shuji
The Research Institute For Iron Steel And Other Metals
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ARATA Yoshiaki
Osaka University
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Fujimori Hiroyasu
The Research Institute For Electric And Magnetic Materials
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Fujimori Hiroyasu
The Research Institute For Iron Steel And Other Metals Tohoku Univesity
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Naka M
Osaka University
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Fujimori Hiroyasu
The Resarch Institute For Iron Steel And Other Metals
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