近赤外光用サブ波長反射防止構造の光学設計および自己組織化ナノ微粒子を用いた製作

概要

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We design subwavelength gratings (SWGs) in 1.55 μm wavelength range used for optical communication devices or solar cells. Also, we propose a novel fabrication technique of SWGs using self-organized nanoparticles, for the large-area and low-cost fabrication. In the fabrication, SiO2 particles with the diameters of 170 nm are spin-coated on a silicon substrate. Then, a 170-nm-period SiO2 particle pattern is formed on the substrate. Using the SiO2 particles as a mask, the silicon substrate is etched by a dry etching machine. A 170-nm-period SWG with tapered profile is fabricated. The SWG height is approximately 820 nm. Reflectivity of the SWG is decreased to be -18.7 dB (1.3%) from -3.39 dB (45.8%) of a Si mirror surface at a wavelength of 1550 nm. Calculated reflectivity of the SWG at a wavelength of 1550 nm is -18.3 dB (1.5%), which almost agrees with the measured value.
2010-03-01