Spectroscopic and Theoretical Studies of Interface States at Ultrathin Oxide/Si Interfaces

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概要

• 論文の詳細を見る
• 1997-09-16

著者

• Nishioka Yasushiro

  Texas Instruments Tsukuba R & D Center

• Nishioka Yasushiro

  Tsukuba Research And Development Center Japan Texas Instruments

• Kobayashi Hidehiko

  Faculty Of Engineering Yamanashi University

• Asano Akira

  Department of Information engineering, Hiroshima University

• YAMASHITA Yoshiyuki

  Department of Chemical Engineering, Tohoku University

• KOBAYASHI Hikaru

  PRESTO, Japan Science and Technology Corporation

• NAKATO Yoshihiro

  Department of Chemistry, Faculty of Engineering Science, and Research Center for Photoenergetics of

• Yamaguchi Yoh-ichi

  Hoya Corporation

• Nishioka Yasushiro

  Texas Instruments Japan Limited Tsukuba Research And Development Center

• Yamashita Yoshiyuki

  Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or

• Yamashita Yoshiyuki

  Institute Of Information Sciences And Electronics University Of Tsukuba

• Yamashita Yoshiyuki

  Department Of Chemical Engineering Tohoku University

• Kobayashi H

  Nagaoka Univ. Technol. Niigata Jpn

• Nishioka Y

  Tsukuba Research And Development Center Japan Texas Instruments

• Nakato Y

  Division Of Chemistry Graduate School Of Engineering Science Osaka University

• Nakato Yoshihiro

  Department Of Chemistry Graduate School Of Engineering Science And Research Center For Photoenergeti

• Asano Akira

  Department Of Information Engineering Graduate School Of Engineering Hiroshima University

• Asano Akira

  Department Of Applied Physics Osaka University

• Asano Akira

  Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or

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