Nishioka Yasushiro | Texas Instruments Tsukuba R & D Center
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概要
関連著者
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Nishioka Yasushiro
Texas Instruments Tsukuba R & D Center
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Nishioka Yasushiro
Tsukuba Research And Development Center Japan Texas Instruments
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Nishioka Y
Tsukuba Research And Development Center Japan Texas Instruments
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Nishioka Yasushiro
Texas Instruments Japan Limited Tsukuba Research And Development Center
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Kobayashi Hidehiko
Faculty Of Engineering Yamanashi University
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Komeda Tadahiro
Texas Instruments Tsukuba R & D Center
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Kobayashi H
Nagaoka Univ. Technol. Niigata Jpn
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Yamaguchi Yoh-ichi
Hoya Corporation
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Yamashita Yoshiyuki
Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or
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Yamashita Yoshiyuki
Institute Of Information Sciences And Electronics University Of Tsukuba
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Nakato Y
Division Of Chemistry Graduate School Of Engineering Science Osaka University
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YAMASHITA Yoshiyuki
Department of Chemical Engineering, Tohoku University
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Namba K
Texas Instruments Ibaraki Jpn
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Namba Kenji
Texas Instruments Tsukuba R & D Center
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KOMEDA Tadahiro
Texas Instruments Tsukuba Research and Development Center Limited
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NAKATO Yoshihiro
Department of Chemistry, Faculty of Engineering Science, and Research Center for Photoenergetics of
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Komeda Tadahiro
Riken (the Institute Of Physical And Chemical Research)
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Komeda Tadahiro
Tsukuba Research And Development Center Texas Instruments
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Yamashita Yoshiyuki
Department Of Chemical Engineering Tohoku University
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Nakato Yoshihiro
Department Of Chemistry Graduate School Of Engineering Science And Research Center For Photoenergeti
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KOBAYASHI Hikaru
Institute of Scientific and Industrial Research, Osaka University
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Kobayashi Hikaru
Institute Of Scientific And Industrial Research Osaka University
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OHDOMARI Iwao
School of Science and Engineering, Waseda University
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Nishioka Yasushiro
Texas Instruments Tsukuba Research And Development Center Limited
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Nishioka Yasushiro
Texas Instruments Tsukuba Research And Development Center
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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松村 正清
東京工業大学工学部:(現)(株)液晶先端技術開発センター
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Sakoda Tatsuya
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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大泊 巌
早大理工
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大泊 巌
早稲田大学理工学術院
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Ohdomari Iwao
School Of Science And Engineering Waseda University
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami-memorial Laboratory For Materials Science
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Ohdomari Iwao
School Of Science And Engineering Waseda University:kagami Memorial Laboratory For Materials Science
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Kobayashi Hikaru
Department Of Surgical Oncology Osaka City University Graduate School Of Medicine
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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NEYA Saburo
Graduate School of Pharmaceutical Sciences, Chiba University
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Neya S
Graduate School Of Pharmaceutical Sciences Chiba University
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Neya Saburo
Department Of Physical Chemistry Kyoto Pharmaceutical University
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Neya Saburo
Graduate School Of Pharmaceutical Sciences Chiba University
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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KOMEDA Tadahiro
Tsukuba R & D Center, Taxas Instruments
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SAKURAI Takeaki
Institute of Scientific and Industrial Research, Osaka University
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PARK Jong
Institute of Scientific and Industrial Research, Osaka University
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NISHIYAMA Masayoshi
Central Workshop, Osaha University
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Katsube T
Saitama Univ. Saitama Jpn
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Neya Saburo
Department Of Physical Chemistry Faculty Of Pharmaceutical Sciences Chiba University
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)nhk Science And Technical Researc
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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Watanabe T
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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PARK Kang-Ho
Basic Research Laboratory, Electronics and Telecommunications Research Institute
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Park Jin
Semiconductor R&d Goldstar Electron Co. Ltd.
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HOSHINO Tadatsugu
Graduate School of Pharmaceutical Sciences, Chiba University
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HATA Masayuki
Graduate School of Pharmaceutical Sciences, Chiba University
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WATANABE Takanobu
School of Science and Engineering, Waseda University
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TATSUMURA Kosuke
School of Science and Engineering, Waseda University
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Park Kang-ho
Basic Research Laboratory. Electronics And Telecommunications Research Institute. Yu-song P.o.
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Park Kang-ho
Telecommunication Basic Research Laboratory
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Park Kang-ho
Basic Research Laboratory Electronics And Telecommunications Research Institute
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MATSUMURA Mieko
Texas Instruments Tsukuba R & D Center
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SAKODA Tomoyuki
Texas Instruments Tsukuba R & D Center
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KOBAYASHI Hikaru
PRESTO, Japan Science and Technology Corporation
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Kuribayashi Hiroki
Corporate R&d Laboratories Pioneer Corporation
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松村 正清
東京工業大学工学部電子物理科
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Nishiyama Masayoshi
Central Workshop Osaha University
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Sakurai T
Department Of Chemical Engineering Science Yokohama National University
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Park J
Electronic Device Group Korea Research Institute Of Standards And Science
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SUU Koukou
Institute for Super Materials, ULVAC Japan, Ltd.
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TANI Noriaki
Institute for Super Materials, ULVAC Japan, Ltd.
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NISHIOKA Yutaka
Institute for Super Materials, ULVAC JAPAN, Ltd.
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Park K‐h
Basic Research Laboratory. Electronics And Telecommunications Research Institute. Yu-song P.o.
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Suu K
Ulvac Inc. Shizuoka Jpn
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Suu Koukou
Institute For Semiconductor Technologies Ulvac Inc.
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Sakoda T
National College Of Technology
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Nishioka Yutaka
Institute For Semiconductor Technologies Ulvac Inc.
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Bhattacharya P
Texas Instruments Tsukuba Research And Development Center Limited
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Sakoda Tadanori
Department Of Electronics And Control Engineering Kitakyushu National College Of Technology
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大泊 巌
早大
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Tani Noriaki
Institute For Super Materials Ulvac Japan Ltd.
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Kobayashi H
Institute Of Scientific And Industrial Research Osaka University:crest Japan Science And Technology
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Sakoda Tomoyuki
Si Technology Development Texas Instruments Inc.
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Watanabe Takanobu
School Of Science And Engineering Waseda University
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Tatsumura Kosuke
School Of Science And Engineering Waseda University
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Hata M
Sanyo Electric Co. Ltd. Osaka Jpn
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Kobayashi Hikaru
Department Of Hematology Nagano Red Cross Hospital
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大泊 巌
早大・理工
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Hoshino T
Graduate School Of Pharmaceutical Sciences Chiba University
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Park Jong
Institute Of Health And Sports Sciences University Of Tsukuba
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Sakurai Takeaki
Institute Of Applied Physics University Of Tsukuba
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Kobayashi H
Institute Of Scientific And Industrial Research Osaka University:crest Japan Science And Technology
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Suu Koukou
Institute for Semiconductor and Electronics Technologies, ULVAC Inc., Susono, Shizuoka 410-1231, Japan
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Sakoda Tomoyuki
National College of Technology
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内田 秀和
埼玉大学
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Nishioka Y
Taxas Instruments Japan Ltd. Tsukuba Research & Development Center
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Asano Akira
Department of Information engineering, Hiroshima University
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KATSUBE Teruaki
Department of Information and Computer Science, Saitama University
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Da Silva
Department Of Organic Chemistry Instituto De Quimica De Araraquara Sao Paulo State University (unesp
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Da Silva
Univ. Federal De Pernambuco Pe Bra
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MORI Toshio
Department of Agro-environmental Sciences, Faculty of Agriculture, Kyushu University
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Hoshino Tyuji
Faculty Of Pharmaceutical Sciences Chiba University
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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Zhang Wen
Department Of Information And Computer Sciences Saitama University
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VASCONCELOS Elder
Department of Information and Computer Sciences, Saitama University
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ZHANG Wenyi
Saitama University
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VASCONCELOS Elder
Saitama University
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UCHIDA Hidekazu
Saitama University
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KATSUBE Teruaki
Saitama University
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NAKATSUBO Toshiya
Texas Instruments Oyama Plant
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Shibata Mari
Ulsi Engineering Division Fujitsu Limited
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DE VASCONCELOS
Departamento de Fisica, Universidade Federal de Pernambuco, Cidade Universitaria
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KATSUBE Teruaki
Graduate School of Science and Engineering, Saitama University
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YOSHIDA Sadafumi
Graduate School of Science and Engineering, Saitama University
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KUMAGAI Yoshinao
Texas Instruments Tsukuba Research and Development Center Limited
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ANDO Atsushi
Electrotechnical Laboratory (ETL)
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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NAMBA Kenji
Department of Chemistry, Faculty of Engineering Science, and Research Center for Photoenergetics of
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Mihara Satoru
Ulsi Engineering Division Fujitsu Limited
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Zhang Wenyi
Department Of Radiation Biophysics Research Institute For Radiation Biology And Medicine Hiroshima U
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PARK Kyung-ho
Texas Instruments Tsukuba Research & Development Center Ltd.
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BHATTACHARYA Pijush
Texas Instruments, Tsukuba Research and Development Center Limited
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BHATTACHARYA Pijush
Tsukuba Research and Development Center, Texas Instruments
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PARK Kyung-ho
Tsukuba Research and Development Center, Texas Instruments
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Komeda Tadahiro
Texas Instruments Tsukuba Research And Development Center
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Katsube Teruaki
Guraduate School Of Science And Engineering Saitama University
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Katsube Teruaki
Department Of Information And Computer Science Saitama University
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Katsube Teruaki
Graduate School Of Science And Engineering Saitama University
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Vasconcelos Elder
Departamento De Fisica Universidade Federal De Pernambuco Cidade Universitaria
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De Vasconcelos
Univ. Federal De Pernambuco Pe Bra
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Nakamura Moritaka
Ulsi Engineering Division Fujitsu Limited
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Nishioka Yasushiro
Taxas Instruments Japan Ltd. Tsukuba Research & Development Center
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OSAWA Akira
Institute for Super Materials, ULVAC Japan, Ltd.
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OZAWA Soichiro
ULSI Engineering Division, FUJITSU LIMITED
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NOSHIRO Hideyuki
ULSI Engineering Division, FUJITSU LIMITED
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HORII Yoshimasa
ULSI Engineering Division, FUJITSU LIMITED
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TAKAMATSU Tomohiro
ULSI Engineering Division, FUJITSU LIMITED
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MASUDA Takeshi
Institute for Super Materials, ULVAC JAPAN, Ltd.
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MIYAGUCHI Yusuke
Institute for Super Materials, ULVAC JAPAN, Ltd.
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YAMAZAKI Tatsuya
ULSI Engineering Division, FUJITSU LIMITED
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Osawa Akira
Institute For Super Materials Ulvac Japan Ltd.
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Masuda T
Division Of Polymer Chemistry Graduate School Of Engineerng Kyoto University
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Miki K
Electrotechnical Laboratory (etl)
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Miki Kazushi
National Institute Of Materials Science (nims)
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Miki Kazushi
Aist
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Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
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Miki Kazushi
Electrotechnical Laboratory
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Park Kyung-ho
Texas Instruments Inc.
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Ozawa Soichiro
Ulsi Engineering Division Fujitsu Limited
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Horii Yoshimasa
Ulsi Engineering Division Fujitsu Limited
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NAKATO Yoshihiro
Research Center for Photoenergetics of Organic Materials and Faculty if Engineering Science, Osaka U
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KOBAYASHI Hikaru
Research Center for Photoenergetics of Organic Materials, and Department of Chemistry, Faculty of En
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YAMASHITA Yoshiyuki
Research Center for Photoenergetics of Organic Materials, and Department of Chemistry, Faculty of En
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NAMBA Kenji
Research Center for Photoenergetics of Organic Materials, and Department of Chemistry, Faculty of En
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Asano Akira
Department Of Information Engineering Graduate School Of Engineering Hiroshima University
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De Vasconcelos
Saitama Univ.
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Nakato Yoshihiro
Research Center For Photoenergetics Of Organic Materials And Department Of Chemistry Faculty Of Engi
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Da Silva
Departamento De Bioquimica Instituto De Quimica Universidade Federal Do Rio De Janeiro
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Nishioka Yasushiro
Texas Instruments Tsukuba Research & Development Center Ltd.
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Yoshida Sadafumi
Graduate School Of Science And Engineering Saitama University
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De Vasconcelos
Departamento De Fisica Universidade Federal De Pernambuco Cidade Universitaria
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Miyaguchi Yusuke
Ulvac Japan Ltd.
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Takamatsu Tomohiro
Ulsi Engineering Division Fujitsu Limited
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Asano Akira
Department Of Applied Physics Osaka University
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Asano Akira
Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or
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Noshiro Hideyuki
Ulsi Engineering Division Fujitsu Limited
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Yamazaki Tatsuya
Ulsi Engineering Division Fujitsu Limited
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Mori Toshio
Department Of Agro-environmental Sciences Faculty Of Agriculture Kyushu University
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Da Silva
Departamento De Biologia Celular Universidade De Brasilia
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Mori Toshio
Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or
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Kobayashi Hikaru
Research Center For Photoenergetics Of Organic Materials And Department Of Chemistry Faculty Of Engi
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Masuda Takeshi
Institute For Environmental Sciences
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Namba Kenji
Research Center For Photoenergetics Of Organic Materials And Department Of Chemistry Faculty Of Engi
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Nishioka Yasushiro
Texas Instruments, Tsukuba Research and Development Center
著作論文
- SiC/SiO_2 Structure Formed at 〜200℃ by Heat Treatment at 950℃ Having Excellent Electrical Characteristics
- SiC/SiO_2 Structure Formed at -200℃ with Excellent Electrical Characteristics
- Nox Detection with Schottky Diodes and Heterojunction Structures (特集:化学センサの機能化,マイクロ化)
- Probability of Atomic or Molecular Oxygen Species in Silicon Silicon Dioxide
- Diffusion of Molecular and Atomic Oxygen in Silicon Oxide
- Radiation Hardness of Epitaxial and Non-Epitaxial 6H-SiC MOS Capacitors
- Interfacial Layer in Thermally-grown Ultra thin Silicon Dioxides Measured by Grazing Incidence X-Ray Reflection
- Surface Preparation, Growth, and Interface Control of Ultrathin Gate Oxides
- Simultaneous Observation of SiO_2 Surface and SiO_2/Si Interface Using Self-Assembled-Monolayer Island
- Spectroscopic and Theoretical Studies of Interface States at Ultrathin Oxide/Si Interfaces
- Interface States at Ultrathin Chemical Oxide/Silicon Interfaces Obtained from Measurements of XPS Spectra under Biases
- Interface States for Si-Based MOS Devices with an Ultrathin Oxide Layer : X-Ray Photoelectron Spectroscopic Measurements under Biases
- Control of Grain Structure of Laser-Deposited (Ba, Sr)TiO_3 Films to Reduce Leakage Current ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Comparative Study of Amorphous and Crystalline (Ba,Sr)TiO_3 Thin Films Deposited by Laser Ablation
- Layer-by-Layer Etching of Si(111) Surface by Oxygen at Elevated Temperature
- Pb Content Control in Sputtered PZT Films for FRAM Mass Production
- Stability Control of Composition of RF-Sputtered Pb(Zr, Ti)O_3 Ferroelectric Thin Film
- New Method for Observation of Interface States in the Semiconductor Band-Gap : XPS Measurements under Biases(Interfaces by various techniques)
- Direct Spectroscopic Evidence of Bias-Induced Shifts of Semiconductor Band Edges for Metal-Insulator-Semiconductor Diodes
- High Temperature STM Observation of Layer-by-Layer Etching of Si(111) with O_2 Flux