High Temperature STM Observation of Layer-by-Layer Etching of Si(111) with O_2 Flux
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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Nishioka Yasushiro
Texas Instruments Tsukuba R & D Center
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Nishioka Yasushiro
Texas Instruments Tsukuba Research And Development Center
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KOMEDA Tadahiro
Texas Instruments Tsukuba Research and Development Center Limited
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Komeda Tadahiro
Texas Instruments Tsukuba R & D Center
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Komeda Tadahiro
Texas Instruments Tsukuba Research And Development Center
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Nishioka Yasushiro
Texas Instruments Japan Limited Tsukuba Research And Development Center
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