Control of Grain Structure of Laser-Deposited (Ba, Sr)TiO_3 Films to Reduce Leakage Current (<Special Issue> FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)

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SiC/SiO_2 Structure Formed at 〜200℃ by Heat Treatment at 950℃ Having Excellent Electrical Characteristics
SiC/SiO_2 Structure Formed at -200℃ with Excellent Electrical Characteristics
Nox Detection with Schottky Diodes and Heterojunction Structures (特集:化学センサの機能化,マイクロ化)
Design of Slider and Suspension for 4 × 1 Probe Array Type Near-Field Scanning Optical Microscope
Probability of Atomic or Molecular Oxygen Species in Silicon Silicon Dioxide
Diffusion of Molecular and Atomic Oxygen in Silicon Oxide
Radiation Hardness of Epitaxial and Non-Epitaxial 6H-SiC MOS Capacitors
Interfacial Layer in Thermally-grown Ultra thin Silicon Dioxides Measured by Grazing Incidence X-Ray Reflection
Surface Preparation, Growth, and Interface Control of Ultrathin Gate Oxides
Simultaneous Observation of SiO_2 Surface and SiO_2/Si Interface Using Self-Assembled-Monolayer Island
Spectroscopic and Theoretical Studies of Interface States at Ultrathin Oxide/Si Interfaces
Interface States at Ultrathin Chemical Oxide/Silicon Interfaces Obtained from Measurements of XPS Spectra under Biases
Interface States for Si-Based MOS Devices with an Ultrathin Oxide Layer : X-Ray Photoelectron Spectroscopic Measurements under Biases
Comparison of Planar to Columnar Transformation of PtSi Layers on Si(001) and Si(111) Substrates in the Si Capping Layer Growth Process
Growth Temperature Dependence of Boron Surface Segregation and Electrical Properties of Boron Delta-Doped Structures Grown by Si Molecular Beam Epitaxy
Control of Grain Structure of Laser-Deposited (Ba, Sr)TiO_3 Films to Reduce Leakage Current ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
Comparative Study of Amorphous and Crystalline (Ba,Sr)TiO_3 Thin Films Deposited by Laser Ablation
Layer-by-Layer Etching of Si(111) Surface by Oxygen at Elevated Temperature
Near-Field Optical Recording of Photochromic Materials Using Bent Cantilever Fiber Probes
Near-Field Optical Readout Combined with Atomic Force Probe Recording
Minimization of Cut-Off Effect by Use of Self-Focusing Effect to Enhance Throughput on Near-Field Aperture
Pb Content Control in Sputtered PZT Films for FRAM Mass Production
Stability Control of Composition of RF-Sputtered Pb(Zr, Ti)O_3 Ferroelectric Thin Film
Fabrication of a High-Throughput Cantilever-Style Aperture Tip by the Use of the Bird's-Beak Effect
New Method for Observation of Interface States in the Semiconductor Band-Gap : XPS Measurements under Biases(Interfaces by various techniques)
Direct Spectroscopic Evidence of Bias-Induced Shifts of Semiconductor Band Edges for Metal-Insulator-Semiconductor Diodes
EELS elemental mapping of a DRAM with FE-TEM
EDS elemental mapping of a DRAM with an FE-TEM
High Temperature STM Observation of Layer-by-Layer Etching of Si(111) with O_2 Flux
Thermal Nitridation and Oxygen-induced Etching Reactions: A Comparative Study on Si(100) and (111) Surfaces by Scanning Tunneling Microscopy
Selective Manipulation of Ag Nanoclusters on a Passivated Silicon Surface Using a Scanning Tunneling Microscope
Mixed Ge-Si Dimer Formation in Ge/Si(100) and Si/Ge(100) Growth
Fabrication of Slider-Type Near-Field Arrayed Probe for Optical Data Storage
Comparison of Measurement Techniques for Gate Shortening in Sob-Micrometer Metal Oxide Semiconductor Field Effect Transistors
Fabrication of Slider-Type Near-Field Arrayed Probe for Optical Data Storage
STM and Cluster Calculation Study of Segregated B on Si(001) Surface
Theoretical Estimation of the Energy Differences among OH-, F-, and H-terminations of the Si Surface
Design of Slider and Suspension for $4\times 1$ Probe Array Type Near-Field Scanning Optical Microscope
Hole Accumulation in SiO_2/Si_3N_4/SiO_2 Capacitors Prior to Dielectric Breakdown
X-Ray Radiation Response of Epitaxial and Nonepitaxial n-6H–SiC Metal-Oxide-Semiconductor Capacitors
Fabrication of a High-Throughput Cantilever-Style Aperture Tip by the Use of the Bird's-Beak Effect
Thermal Nitridation and Oxygen-induced Etching Reactions: A Comparative Study on Si(100) and (111) Surfaces by Scanning Tunneling Microscopy
Minimization of Cut-Off Effect by Use of Self-Focusing Effect to Enhance Throughput on Near-Field Aperture

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