Osawa Akira | Institute For Super Materials Ulvac Japan Ltd.
スポンサーリンク
概要
関連著者
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SUU Koukou
Institute for Super Materials, ULVAC Japan, Ltd.
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OSAWA Akira
Institute for Super Materials, ULVAC Japan, Ltd.
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TANI Noriaki
Institute for Super Materials, ULVAC Japan, Ltd.
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Suu K
Ulvac Inc. Shizuoka Jpn
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Suu Koukou
Institute For Semiconductor Technologies Ulvac Inc.
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Osawa Akira
Institute For Super Materials Ulvac Japan Ltd.
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Tani Noriaki
Institute For Super Materials Ulvac Japan Ltd.
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Suu Koukou
Institute for Semiconductor and Electronics Technologies, ULVAC Inc., Susono, Shizuoka 410-1231, Japan
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Nishioka Yasushiro
Texas Instruments Tsukuba R & D Center
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Nishioka Yasushiro
Tsukuba Research And Development Center Japan Texas Instruments
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Ishikawa M
Institute For Solid State Physics The University Of Tokyo
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Nakamura K
Department Of Electrical Engineering School Of Engineering Nagoya University
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Ishikawa Mitsuo
Department Of Chemical Technology Kurashiki University Of Science And Arts
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Ishikawa M
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
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ISHIKAWA Michio
Institute for Super Materials, ULVAC Japan, Ltd.
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NAKAMURA Kyuzo
Institute for Super Materials, ULVAC Japan, Ltd.
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OZAWA Takanori
VLSI R&D Division, ROHM Co., Ltd.
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SAMESHIMA Katsumi
VLSI R&D Division, ROHM Co., Ltd.
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KAMISAWA Akira
VLSI R&D Division, ROHM Co., Ltd.
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TAKASU Hideshi
VLSI R&D Division, ROHM Co., Ltd.
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NISHIOKA Yutaka
Institute for Super Materials, ULVAC JAPAN, Ltd.
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Ozawa Takanori
Vlsi R&d Division Rohm Co. Ltd.
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Takasu Hideshi
Vlsi R&d Division Rohm Co. Ltd.
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Kamisawa Akira
Vlsi R&d Division Rohm Co. Ltd.
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Nishioka Y
Tsukuba Research And Development Center Japan Texas Instruments
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Nishioka Yutaka
Institute For Semiconductor Technologies Ulvac Inc.
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Ishikawa M
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Sameshima Katsumi
Vlsi R&d Division Rohm Co. Ltd.
著作論文
- Preparation of (Pb, La)(Zr, Ti)O_3 Ferroelectric Films by RF Sputtering on Large Substrate
- Stability Control of Composition of RF-Sputtered Pb(Zr, Ti)O_3 Ferroelectric Thin Film