Nitrogen Profile in SiO_xN_y Prepared by Thermal Nitridation of Ozone Oxide
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概要
- 論文の詳細を見る
- 2001-06-01
著者
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Kimura Kenji
Department of Engineering Science, Kyoto University
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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Fukuda Hisashi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Te
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Ichimura Shingo
Frontier Technology Division Electrotechnical Laboratory
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Nakajima K
Department Of Engineering Physics And Mechanics Kyoto University
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KUROKAWA Akira
Frontier Technology Division, Electrotechnical Laboratory
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Nakajima Kaoru
Department Of Engineering Physics And Mechanics Kyoto University
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Fukuda Hisashi
Department Of Electrical And Electronic Engineering Muroran Institute Of Technology
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Kurokawa Akira
Frontier Technology Division Electrotechnical Laboratory
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Fukuda Hisashi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Muroran Institute Of Tech
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Kimura K
Department Of Engineering Physics And Mechanics Kyoto University
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Kimura Kenji
Department Of Engineering Science Kyoto University
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Kimura Kenji
Deparment Of Engineering Science Kyoto University
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