Analysis of Ultra-Thin HfO_2/SiON/Si(001) : Comparison of Three Different Techniques
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概要
- 論文の詳細を見る
- 2010-02-10
著者
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Conard Thierry
Interuniversity Micro Electronics Center (imec)
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Kimura Kenji
Department of Engineering Science, Kyoto University
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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Kimura Kenji
Department Of Micro Engineering Kyoto University
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Nakamura Kunio
Department Of Micro Engineering Kyoto University
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Nakajima Kaoru
Department Of Micro Engineering Kyoto University
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VANDERVORST Wilfried
IMEC, Kapeldreef
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Nakajima Kaoru
Department Of Engineering Physics And Mechanics Kyoto University
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Conard Thierry
Imec
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BERGMAIER Andreas
Institut fur Angewandte Physik und Messtechnik, Universitat de Bundeswehr Munchen
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DOLLINGER Gunther
Institut fur Angewandte Physik und Messtechnik, Universitat de Bundeswehr Munchen
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Vandervorst Wilfried
Imec
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Dollinger Gunther
Institut Fur Angewandte Physik Und Messtechnik Universitat De Bundeswehr Munchen
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Bergmaier Andreas
Institut Fur Angewandte Physik Und Messtechnik Universitat De Bundeswehr Munchen
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Kimura Kenji
Deparment Of Engineering Science Kyoto University
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