Kimura K | Department Of Engineering Physics And Mechanics Kyoto University
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概要
関連著者
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Kimura Kenji
Department of Engineering Science, Kyoto University
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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Nakajima Kaoru
Department Of Engineering Physics And Mechanics Kyoto University
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Kimura K
Department Of Engineering Physics And Mechanics Kyoto University
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Kimura Kenji
Deparment Of Engineering Science Kyoto University
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Okazaki Yasutaka
Department Of Engineering Physics And Mechanics Kyoto University
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Okazaki Y
Department Of Engineering Physics And Mechanics Kyoto University
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Fukuda Hisashi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Te
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Ichimura Shingo
Frontier Technology Division Electrotechnical Laboratory
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Nakajima K
Department Of Engineering Physics And Mechanics Kyoto University
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KUROKAWA Akira
Frontier Technology Division, Electrotechnical Laboratory
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KOBAYASHI Hajime
Environment & Analysis Technology Department, Technical Support Center, Sony Corporation
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MIWA Shiro
Environment & Analyisis Technology Department, Technical Support Center, Sony Corporation
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SATORI Kotaro
Environment & Analyisis Technology Department, Technical Support Center, Sony Corporation
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Fukuda Hisashi
Department Of Electrical And Electronic Engineering Muroran Institute Of Technology
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Kurokawa Akira
Frontier Technology Division Electrotechnical Laboratory
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Fukuda Hisashi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Muroran Institute Of Tech
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Satori Kotaro
Environment & Analyisis Technology Department Technical Support Center Sony Corporation
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Kobayashi Hajime
Environment & Analysis Technology Department Technical Support Center Sony Corporation
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Kimura Kenji
Department Of Engineering Science Kyoto University
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Miwa Shiro
Environment & Analyisis Technology Department Technical Support Center Sony Corporation
著作論文
- Nitrogen Profile in SiO_xN_y Prepared by Thermal Nitridation of Ozone Oxide
- Nitrogen Depth Profiling in Ultrathin Silicon Oxynitride Films with High-Resolution Rutherford Backscattering Spectroscopy
- Oxidation of Si(001) Surfaces Studied by High-Resolution Rutherford Backscattering Spectroscopy