Nitrogen Depth Profiling in Ultrathin Silicon Oxynitride Films with High-Resolution Rutherford Backscattering Spectroscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-30
著者
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Kimura Kenji
Department of Engineering Science, Kyoto University
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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Okazaki Yasutaka
Department Of Engineering Physics And Mechanics Kyoto University
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Nakajima Kensuke
Research Institute Of Electrical Communication Tohoku University
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Nakajima Kaoru
Department Of Engineering Physics And Mechanics Kyoto University
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Okazaki Y
Department Of Engineering Physics And Mechanics Kyoto University
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KOBAYASHI Hajime
Environment & Analysis Technology Department, Technical Support Center, Sony Corporation
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MIWA Shiro
Environment & Analyisis Technology Department, Technical Support Center, Sony Corporation
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SATORI Kotaro
Environment & Analyisis Technology Department, Technical Support Center, Sony Corporation
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Satori Kotaro
Environment & Analyisis Technology Department Technical Support Center Sony Corporation
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Kobayashi Hajime
Environment & Analysis Technology Department Technical Support Center Sony Corporation
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Kimura K
Department Of Engineering Physics And Mechanics Kyoto University
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Kimura Kenji
Deparment Of Engineering Science Kyoto University
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Miwa Shiro
Environment & Analyisis Technology Department Technical Support Center Sony Corporation
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