2311 カーボン基板を用いたX線マスクの開発(マイクロメカニズム,一般講演)

概要

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The LIGA process makes it possible to create a 3 dimensional structure of high aspect ratio, the minimum width and length dimensions being in terms of sub-micrometers and the maximum height more than 1 mm. For X-ray lithography process, the accuracy of a fabricated structure depends largely on the accuracy of the X-ray mask. The accuracy of the X-ray mask pattern and the variation of the membrane by the thermal of X-ray are crucial for X-ray lithography. Therefore, we have developed the X-ray mask that uses carbon substrate as membrane. By using this X-ray mask, we have fabricated a high aspect ratio structure of 4 inch size PMMA substrate. The structure consisting of 1 mm height with a high aspect ratio can be manufactured without the bend of the membrane by the thermal of X-ray.
社団法人日本機械学会の論文
2008-04-20