A Silicon Based Nanometric Oscillator for Scanning Force Microcopy Operating in the 100 MHz Range

概要

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The detectable force resolution of a mechanical oscillator used in scanning force microscopy can be improved by increasing is natural frequency f_0, quality factor Q, and by decreasing the spring constant k and the temperature of operation T. For an oscillator having a structure that can be modeled as a concentrated mass-spring model, decreasing the mass of the oscillator is desirable, since high f_O can then be obtained without increasing the spring constant k. We have developed a novel fabrication technique for a head-neck shaped nanometric oscillator by selective etching a laminated silicon substrate known as SIMOX. The oscillator head or mass measures 60 nm or 170 nm in thickness and 100 nm to 500 nm in diameter, depending on the size of the mask. The neck, which serves as and elastic support for the mass, measures 100 nm in length. The oscillator could be tailored to have natural frequency in the range of 0.01 GHz to 0.5 GHz, and a spring constant between 10^<-1>N/m and 10^<-2>N/m.
社団法人応用物理学会の論文
1999-06-30