Electroplated and Dry-Released Metallic Microstructures for a Lateral Tunneling Unit Application
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-02-15
著者
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FUJITA Hiroyuki
Institute of Industrial Science, The University of Tokyo
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KOBAYASHI Dai
Institute of Industrial Science, University of Tokyo
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Fujita H
Graduate School Of Biological Sciences Nara Institute Of Science And Technology
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Kobayashi D
Institute Of Industrial Science The University Of Tokyo
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Kobayashi Dai
Institute Of Industrial Science The University Of Tokyo
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Hirano T
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Hirano Toshiki
IBM Research, Tokyo Research Laboratory
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Furuhata Tomotake
IBM Research, Tokyo Research Laboratory
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Fujita Hiroyuki
Institude Of Industrial Science The University Of Tokyo Fujita Lab.
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Furuhata Tomotake
Ibm Research Tokyo Research Laboratory
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