In-Situ RHEED Monitoring of Hydrogen Plasma Cleaning on Semiconductor Surfaces : Beam-Induced Physics and Chemistry

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-01-31

著者

• Honda Y

  Department Of Electronics Nagoya University

• Honda Yoshio

  Department Of Electronics School Of Engineering Nagoya University Chikusa-ku Nagoya

• Honda Y

  Tokyo Inst. Technol. Tokyo Jpn

• Honda Yoshio

  Department Of Electronics Nagoya University

• Honda Y

  Hitachi Ltd. Kokubunji‐shi Jpn

• Honda Y

  Tsukuba Research Laboratory Sumitomo Chemical Co. Ltd.

• HONDA Yoshiaki

  Faculty of Engineering, Hiroshima University

• SUEMUNE Ikuo

  Faculty of Engineering, Hiroshima University

• YAMANISHI Masamichi

  Faculty of Engineering, Hiroshima University

• KISHIMOTO Akihiro

  Faculty of Engineering, Hiroshima University

• HAMAOKA Kazuhiko

  Faculty of Engineering, Hiroshima University

• KOUI Tomoaki

  Faculty of Engineering, Hiroshima University

• Koui Tomoaki

  Faculty Of Engineering Hiroshima University

• Suemune I

  Hiroshima Univ. Higashihiroshima

• Kishimoto A

  Faculty Of Engineering Hiroshima University

• Yamanishi Masamichi

  Faculty Of Engineering Hiroshima University

• Suemune Ikuo

  Faculty Of Engineering Hiroshima University

• Hamaoka Kazuhiko

  Faculty Of Engineering Hiroshima University

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