Mechanism of Reactive Ion Etching Lag in WSi_2 Etching Using Electron Cyclotron Resonance Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-04-30

著者

• Fujiwara Nobuo

  Ulsi Laboratory Mitsubishi Electric Corporation

• Maruyama T

  Tokyo Inst. Technol. Yokohama Jpn

• Maruyama T

  Faculty Of Engineering Niigata University

• Maruyama T

  Meijo Univ. Nagoya Jpn

• MARUYAMA Takahiro

  ULSI Laboratory, Mitsubishi Electric Corporation

• YONEDA Masahiro

  ULSI Laboratory, Mitsubishi Electric Corporation

• TSUKAMOTO Katsuhiro

  Kitaitami Works, Mitsubishi Electric Corporation

• BANJO Toshinobu

  Kitaitami Works, Mitsubishi Electric Corporation

• Tsukamoto K

  Univ. Tokyo Tokyo Jpn

• Fujiwara N

  Ulsi Development Center Mitsubishi Electric Corporation

• Tsukamoto K

  Ulsi Laboratory Mitsubishi Electric Corporation

• Banjo T

  Mitsubishi Electric Corp. Hyogo Jpn

• Yoneda M

  Api Corp. Ltd. Gifu Jpn

• Yoneda Masahiro

  Ulsi Laboratory Mitsubishi Electric Corporation

• Fujiwara Nobuo

  ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan

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