Etching Characteristics of WSi_2 with Pulsed-Electron Cyclotron Resonance Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-30
著者
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Fujiwara Nobuo
Ulsi Laboratory Mitsubishi Electric Corporation
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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Maruyama T
Meijo Univ. Nagoya Jpn
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Maruyama T
Department Of Photonics Ritsumeikan University
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MARUYAMA Takahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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OGINO Satoshi
ULSI Laboratory, Mitsubishi Electric Corporation
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YONEDA Masahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Fujiwara N
Ulsi Development Center Mitsubishi Electric Corporation
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OGINO Satoshi
Food/Brewing section, Yamanashi Inrustrial Technology Center
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Maruyama Takeo
Faculty Of Engineering Niigata University
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Ogino Satoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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Yoneda M
Api Corp. Ltd. Gifu Jpn
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Yoneda Masahiro
Ulsi Laboratory Mitsubishi Electric Corporation
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Fujiwara Nobuo
ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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