Influence of Puled Electron Cyclotron Resonance Plasma on Gate Electrode Etching
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-04-01
著者
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Fujiwara Nobuo
Ulsi Laboratory Mitsubishi Electric Corporation
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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Maruyama T
Meijo Univ. Nagoya Jpn
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Maruyama T
Department Of Photonics Ritsumeikan University
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MARUYAMA Takahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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MIYATAKE Hiroshi
ULSI Laboratory, Mitsubishi Electric Corporation
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Fujiwara N
Ulsi Development Center Mitsubishi Electric Corporation
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Maruyama Takeo
Faculty Of Engineering Niigata University
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Miyatake Hiroshi
Ulsi Development Center Mitsubishi Electric Corporation
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Fujiwara Nobuo
ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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