Nitrogen Doping into Cu_2O Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-01
著者
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MARUYAMA Takahiro
Department of Chemistry, Faculty of Science, Kyoto University
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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Kato Shinya
Institute Of Applied Physics University Of Tsukuba
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Maruyama T
Meijo Univ. Nagoya Jpn
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Maruyama T
Department Of Photonics Ritsumeikan University
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AKIMOTO Katsuhiro
Institute of Applied Physics, University of Tsukuba
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ISHIZUKA Shogo
Institute of Applied Physics, University of Tsukuba
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Maruyama Takeo
Faculty Of Engineering Niigata University
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Akimoto Katsuhiro
Institute Of Applied Physics University Of Tsukuba
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Maruyama Takahiro
Department Of Chemistry Faculty Of Science Kyoto University
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Akimoto K
Institute Of Applied Physics University Of Tsukuba
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Ishizuka Shogo
Institute Of Applied Physics University Of Tsukuba
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