SiO_2 Etching in C_4F_8/O_2 Electron Cyclotron Resonance Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-04-30

著者

• Fujiwara Nobuo

  Ulsi Laboratory Mitsubishi Electric Corporation

• Maruyama T

  Tokyo Inst. Technol. Yokohama Jpn

• Maruyama T

  Faculty Of Engineering Niigata University

• Maruyama T

  Meijo Univ. Nagoya Jpn

• Maruyama T

  Department Of Photonics Ritsumeikan University

• MARUYAMA Takahiro

  ULSI Laboratory, Mitsubishi Electric Corporation

• YONEDA Masahiro

  ULSI Laboratory, Mitsubishi Electric Corporation

• SIOZAWA Kein-itiro

  ULSI Laboratory, Mitsubishi Electric Corporation

• TABARU Kenji

  ULSI Laboratory, Mitsubishi Electric Corporation

• Fujiwara N

  Ulsi Development Center Mitsubishi Electric Corporation

• Maruyama Takeo

  Faculty Of Engineering Niigata University

• SIOZAWA Ken-itiro

  ULSI Laboratory, Mitsubishi Electric Corp.

• Tabaru Kenji

  Ulsi Laboratory Mitsubishi Electric Corporation

• Siozawa Ken-itiro

  Ulsi Laboratory Mitsubishi Electric Corp.

• Yoneda M

  Api Corp. Ltd. Gifu Jpn

• Yoneda Masahiro

  Ulsi Laboratory Mitsubishi Electric Corporation

• Fujiwara Nobuo

  ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan

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