MARUYAMA Takahiro | ULSI Laboratory, Mitsubishi Electric Corporation
スポンサーリンク
概要
関連著者
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Fujiwara Nobuo
Ulsi Laboratory Mitsubishi Electric Corporation
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MARUYAMA Takahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Maruyama T
Meijo Univ. Nagoya Jpn
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Fujiwara N
Ulsi Development Center Mitsubishi Electric Corporation
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Fujiwara Nobuo
ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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YONEDA Masahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Yoneda M
Api Corp. Ltd. Gifu Jpn
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Yoneda Masahiro
Ulsi Laboratory Mitsubishi Electric Corporation
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Maruyama T
Department Of Photonics Ritsumeikan University
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Maruyama Takeo
Faculty Of Engineering Niigata University
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MIYATAKE Hiroshi
ULSI Laboratory, Mitsubishi Electric Corporation
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OGINO Satoshi
ULSI Laboratory, Mitsubishi Electric Corporation
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Miyatake Hiroshi
Ulsi Development Center Mitsubishi Electric Corporation
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Ogino Satoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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OGINO Satoshi
Food/Brewing section, Yamanashi Inrustrial Technology Center
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SAKAMORI Shigenori
ULSI Laboratory, Mitsubishi Electric Corporation
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TSUKAMOTO Katsuhiro
Kitaitami Works, Mitsubishi Electric Corporation
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BANJO Toshinobu
Kitaitami Works, Mitsubishi Electric Corporation
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Tsukamoto K
Univ. Tokyo Tokyo Jpn
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Tsukamoto K
Ulsi Laboratory Mitsubishi Electric Corporation
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Banjo T
Mitsubishi Electric Corp. Hyogo Jpn
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Sakamori Shigenori
Ulsi Development Center Mitsubishi Electric Corporation
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SIOZAWA Kein-itiro
ULSI Laboratory, Mitsubishi Electric Corporation
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TABARU Kenji
ULSI Laboratory, Mitsubishi Electric Corporation
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SIOZAWA Ken-itiro
ULSI Laboratory, Mitsubishi Electric Corp.
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Tabaru Kenji
Ulsi Laboratory Mitsubishi Electric Corporation
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Siozawa Ken-itiro
Ulsi Laboratory Mitsubishi Electric Corp.
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Miyatake Hiroshi
ULSI Laboratory, Mitsubishi Electric Corporation,
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Fujiwara Nobuo
ULSI Laboratory, Mitsubishi Electric Corporation,
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Sakamori Shigenori
ULSI Laboratory, Mitsubishi Electric Corporation,
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Ogino Satoshi
ULSI Laboratory, Mitsubishi Electric Corporation,
著作論文
- Effect of Electron Shading on Gate Oxide Degradation
- Reduction of Charge Build-Up with Pulse-Modulated Bias in Pulsed Electron Cyclotron Resonance Plasma
- Influence of Puled Electron Cyclotron Resonance Plasma on Gate Electrode Etching
- Reduction of Charge Build-up with High-Power Pulsed Electron Cyclotron Resonance Plasma
- Evaluation of Electron Shading Charge Buildup Damage Using Metal-Nitride-Oxide-Silicon Capacitors
- Etching Characteristics of WSi_2 with Pulsed-Electron Cyclotron Resonance Plasma
- Precise Evaluation of Pattern Distortion with Variation of the Impurity Concentration and Conductivity of Silicon Films
- SiO_2 Etching in C_4F_8/O_2 Electron Cyclotron Resonance Plasma
- Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma
- Profile Control of poly-Si Etching in Electron Cyclotron Resonance Plasma
- Mechanism of Reactive Ion Etching Lag in WSi_2 Etching Using Electron Cyclotron Resonance Plasma
- Effect Plasma Transport on Etched Profiles with Surface Topography in Diverging Field Electron Cyclotron Resonance Plasma
- Effect of Electron Shading on Gate Oxide Degradation
- Reduction of Charge Build-Up with Pulse-Modulated Bias in Pulsed Electron Cyclotron Resonance Plasma