SAKAMORI Shigenori | ULSI Laboratory, Mitsubishi Electric Corporation
スポンサーリンク
概要
関連著者
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Fujiwara Nobuo
Ulsi Laboratory Mitsubishi Electric Corporation
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SAKAMORI Shigenori
ULSI Laboratory, Mitsubishi Electric Corporation
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MIYATAKE Hiroshi
ULSI Laboratory, Mitsubishi Electric Corporation
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Fujiwara N
Ulsi Development Center Mitsubishi Electric Corporation
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Maruyama T
Meijo Univ. Nagoya Jpn
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MARUYAMA Takahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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Maruyama T
Department Of Photonics Ritsumeikan University
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YONEDA Masahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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OIKAWA Kota
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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YAMANAKA Michinari
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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SASAKI Tomoyuki
ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.
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YONEKURA Kazumasa
ULSI Laboratory, Mitsubishi Electric Corporation
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KIRITANI Masahide
ULSI Laboratory, Mitsubishi Electric Corporation
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YOKOI Takahiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Maruyama Takeo
Faculty Of Engineering Niigata University
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Miyatake Hiroshi
Ulsi Development Center Mitsubishi Electric Corporation
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Sakamori Shigenori
Ulsi Development Center Mitsubishi Electric Corporation
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Yoneda M
Api Corp. Ltd. Gifu Jpn
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Yoneda Masahiro
Ulsi Laboratory Mitsubishi Electric Corporation
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Fujiwara Nobuo
ULSI Development Center, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
著作論文
- Effect of Electron Shading on Gate Oxide Degradation
- Evaluation of Electron Shading Charge Buildup Damage Using Metal-Nitride-Oxide-Silicon Capacitors
- Transformation of Dense Contact Holes during SiO_2 Etching
- Effects of Charge Build-up of Underlying Layer by High Aspect Ratio Etching