Low-Temperature Crystallization of Hydrogenated Amorphous Silicon Induced by Nickel Silicide Formation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-12-20

著者

• ONARI Seinosuke

  Institute of Applied Physics, The University of Tsukuba

• ARAI Toshihiro

  Institute of Applied Physics, The University of Tsukuba

• Kudo Hiroshi

  Institute Of Applied Physics University Of Tsukuba

• Arai Takeshi

  The Faculty Of Engineering Saitama University

• 新井 豊子

  金大院自然

• Arai Toshihiro

  Institute For Optical Research Kyoiku University

• KAWAZU Yoshiyuki

  Oki Ekectric Industry Co., Ltd.

• KAWAZU Yunosuke

  Institute of Applied Physics, University of Tsukuba

• Kawazu Y

  Nihon Univ. Koriyama Jpn

• Onari S

  Institute Of Applied Physics University Of Tsukuba

• Onari Seinosuke

  Institute For Optical Research Tokyo University Of Education

• Arai Toshihiro

  Institte For Optical Research Kyoiku University

• Kanda H

  Univ. Tsukuba Ibaraki

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