原子系における内部変位と弾性的性質 : (第2報, ナノ薄膜シリコンの弾性定数の評価)

概要

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The elastic properties of thin silicon films were investigated using the Martin's method, which is useful for obtaining the internal displacement and elastic constants. It was found that a 1.6 nm thin film becomes very soft compared with the bulk value. Newly defined atomic elastic constants showed that the internal displacement of the atoms within 2-3 surface layers reduces elastic constants near the surface and throughout the thin film. The films with a thickness of about 20 nm or less become soft due to the effect of the internal displacement of the surface atoms. Thin films with a thickness of 2 nm or less become soft due to the the change in the atomic bonding properties. The macro-micro boundary is about 10 nm in thickness if a 10% decrease in elastic constants is defined as the boundary.
一般社団法人日本機械学会の論文
1998-04-26