Effectiveness of Aluminum Incorporation in Nickel Silicide and Nickel Germanide Metal Gates for Work Function Reduction
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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SAMUDRA Ganesh
Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singa
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YEO Yee-Chia
Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singa
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Kwong Dim-Lee
Institute of Microelectronics
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Lim Andy
Silicon Nano Device Lab. Dept. Of Electrical And Computer Engineering National University Of Singapo
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Samudra Ganesh
Silicon Nano Device Lab. Dept. Of Electrical And Computer Engineering National University Of Singapo
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Samudra Ganesh
Silicon Nano Device Lab. Department Of Electrical And Computer Engineering National University Of Si
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Yeo Yee-chia
Silicon Nano Device Lab. Dept. Of Electrical And Computer Engineering National University Of Singapo
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Yeo Yee-chia
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
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Yeo Yee-chia
Silicon Nano Device Lab (sndl) Ece Department National University Of Singapore
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LEE Rinus
Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singa
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KOH Alvin
Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singa
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Lee Rinus
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
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Koh Alvin
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
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Samudra Ganesh
Silicon Nano Device Lab Dept. Of Ece National University Of Singapore (nus)
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Lim Andy
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
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Samudra Ganesh
Silicon Nano Device Lab. Department Of Electrical And Computer Engineering National University Of Si
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