Dynamic Bias-Temperature Instability in Ultrathin SiO_2 and HfO_2 Metal-Oxide-Semiconductor Field Effect Transistors and Its Impact on Device Lifetime
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-11-30
著者
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YEO Yee-Chia
Silicon Nano Device Lab., Dept. of Electrical and Computer Engineering, National University of Singa
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Kwong Dim
Microelectronics Research Center Department Of Ece University Of Texas
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Li Ming
Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
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Wang Xin
Silicon Nano Device Lab (sndl) Ece Department National University Of Singapore
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Li Ming
Silicon Nano Device Lab (sndl) Ece Department National University Of Singapore
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SHEN Chen
Silicon Nano Device Lab, Dept. of ECE, National University of Singapore (NUS)
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CHEN Gang
Silicon Nano Device Lab (SNDL), ECE Department, National University of Singapore
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YU Hong
Silicon Nano Device Lab (SNDL), ECE Department, National University of Singapore
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