YAMAGUCHI Takeshi | Advanced LSI Technology Laboratory, Toshiba Corporation
スポンサーリンク
概要
関連著者
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YAMAGUCHI Takeshi
Advanced LSI Technology Laboratory, Toshiba Corporation
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Fukushima Noburu
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Takayanagi Mariko
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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Matsushita Daisuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Yukie
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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FUKUSHIMA Noburu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Koyama Masato
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Yamaguchi T
Nikon Corp. Tokyo Jpn
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Hirano Izumi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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SEKINE Katsuyuki
Semiconductor Company, Toshiba Corporation
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TAKAYANAGI Mariko
Semiconductor Company, Toshiba Corporation
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EGUCHI Kazuhiro
Semiconductor Company, Toshiba Corporation
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Eguchi Kazuhiro
Semiconductor Company Toshiba Corporation
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Sekine Katsuyuki
Semiconductor Company Toshiba Corporation
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Matsushita Daisuke
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Takagi S
Process & Manufacturing Center Semiconductor Company Toshiba Corporation
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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SATAKE Hideki
Advanced LSI Technology Laboratory Research & Development Center, Toshiba Co.
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SATOU Nobutaka
Toshiba Nanoanalysis Corporation
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TAKAGI Shin-ichi
Advanced LSI Technology Laboratory, Toshiba Corporation
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Mitani Yuichiro
Advanced Lsi Technology Laboratory Toshiba Corporation
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Mitani Yuichiro
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Koyama M
Advanced Lsi Technology Laboratory Toshiba Corporation
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Satake Hideki
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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IIJIMA Ryosuke
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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SCHIMIZU Tatsuo
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Schimizu T
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Schimizu Tatsuo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Iijima Ryosuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Fukushima N
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Takayanagi Mariko
Center For Semiconductor Research & Development Toshiba Corporation Semiconductor Company
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiha Corporation
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SUZUKI Motofumi
Department of Global Agricultural Sciences, Graduate School of Agricultural and Life Sciences
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Kimura Kenji
Department of Engineering Science, Kyoto University
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INUMIYA Seiji
Semiconductor Leading Edge Technologies, Inc.
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Inumiya Seiji
Semiconductor Company Toshiba Corporation
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Suzuki S
System Designing Section 2nd Designing Department Industrial Supplies & Equipment Division Nikon
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Kimura Kenji
Dep. Of Micro Engineering Kyoto Univ.
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NAKAJIMA Kaoru
Department of Micro Engineering, Kyoto University
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JOUMORI Shinji
Department of Engineering Physics and Mechanics, Kyoto University
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Nishiyama Akira
Advanced LSI Technology Laboratory, Corporate R & D Center, Toshiba Corporation
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Yoshiki Masahiko
Toshiba Nanoanalysis Corporation
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Suzuki Shohei
System Designing Section 2nd Designing Department Industrial Supplies & Equipment Division Nikon
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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TAKASHIMA Akira
Enviromental Engineering & Analysis Center, Toshiba Corporation
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FUKUSHIMA Noboru
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation
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Takashima Akira
Enviromental Engineering & Analysis Center Toshiba Corporation
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Takashima Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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SUZUKI Masamichi
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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TAKAYANAGI Mariko
SoC Research & Development Center, Toshiba Corporation Semiconductor Company
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Kawata Shintaro
System Designing Section 2nd Designing Department Industrial Supplies & Equipment Division Nikon
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YAMAGUCHI Takeshi
System Designing Section, 2nd Designing Department, Industrial Supplies & Equipment Division, Nikon
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SATO Tatsuo
System Designing Section, 2nd Designing Department, Industrial Supplies & Equipment Division, Nikon
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SATO Yu
System Designing Section, 2nd Designing Department, Industrial Supplies & Equipment Division, Nikon
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Sato Yu
System Designing Section 2nd Designing Department Industrial Supplies & Equipment Division Nikon
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Suzuki Masamichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Sato Tatsuo
System Designing Section 2nd Designing Department Industrial Supplies & Equipment Division Nikon
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Fukushima N
Corporate Research & Development Center Toshiba Corporation
著作論文
- Structure of Ultrathin Epitaxial CeO_2 Films Grown on Si(111)
- Improvement of Memory Characteristics of Metal-Ferroelectrics/Insulating Buffer Layer/Semiconductor Structures by Combination of Pulsed Laser Deposited SrBi_2Ta_2O_9 Films and Ultra-Thin SiN Buffer Layers
- Improvement of Memory Characteristics of MFIS Structures by Combination of Pulsed Laser Deposited SrBi_2Ta_2O_9 Films and Ultra-Thin SiN Buffer Layers
- Impact of Captured-Carrier Distribution on Recovery Characteristics of Positive- and Negative-Bias Temperature Instability in HfSiON/SiO_2 Gate Stack
- Influences of initial bulk traps on Negative Bias Temperature Instability of HfSiON
- Universal thermal activation process and current induced degradation on dielectric breakdown in HfSiO(N)
- High quality La aluminates/Si (100) interface realized by passivation of Si dangling bonds with one monolayer epitaxial SrSi_2
- Influence of pre-existing electron traps on drive current in MISFETs with HfSiON gate dielectrics
- New Linewidth Measurement System Using Environmental Scanning Electron Microscope Technology
- Enhancement of Dielectric Constant due to Expansion of Lattice Spacing in CeO_2 Directly Grown on Si(111)