Schimizu Tatsuo | Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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概要
- SCHIMIZU Tatsuoの詳細を見る
- 同名の論文著者
- Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporationの論文著者
関連著者
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Schimizu Tatsuo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Matsushita Daisuke
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Matsushita Daisuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Nishikawa Yukie
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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FUKUSHIMA Noburu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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YAMAGUCHI Takeshi
Advanced LSI Technology Laboratory, Toshiba Corporation
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SCHIMIZU Tatsuo
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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SUZUKI Masamichi
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Schimizu T
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Yamaguchi Takeshi
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Fukushima N
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Suzuki Masamichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Fukushima Noburu
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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KAWAKUBO Takashi
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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SATAKE Hideki
Advanced LSI Technology Laboratory Research & Development Center, Toshiba Co.
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SATOU Nobutaka
Toshiba Nanoanalysis Corporation
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Yoshiki Masahiko
Toshiba Nanoanalysis Corporation
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Yoshiki Masahiko
Material Analysis Group Corporate Research And Development Center Toshiba Corp.
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Satake Hideki
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Takashima Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Ohara Ryoichi
Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corp.
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Sano Kenya
Advanced Lsi Technology Laboratory R&d Center Toshiba Corporation
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Koyama Masato
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Fukushima N
Corporate Research & Development Center Toshiba Corporation
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Yoshiki Masahiko
Material Analysis Group, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Kawakubo Takashi
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Sano Kenya
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Schimizu Tatsuo
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
著作論文
- High quality La aluminates/Si (100) interface realized by passivation of Si dangling bonds with one monolayer epitaxial SrSi_2
- Enhancement of Dielectric Constant due to Expansion of Lattice Spacing in CeO_2 Directly Grown on Si(111)
- Physical Understanding of Determinant Factors for φeff on La-based High-k
- Electrical Properties and Thermodynamic Stability of Sr(Ti1-x,Rux)O3 Thin Films Deposited by Inductive-Coupling-Plasma-Induced RF Magnetron Sputtering