Ohara Ryoichi | Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corp.
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概要
- OHARA Ryoichiの詳細を見る
- 同名の論文著者
- Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corp.の論文著者
関連著者
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KAWAKUBO Takashi
Advanced Discrete Semiconductor Technology Laboratory, Corporate Research & Development Center, Tosh
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Ohara Ryoichi
Advanced Lsi Technology Laboratory Corporate Research And Development Center Toshiba Corp.
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Sano Kenya
Advanced Lsi Technology Laboratory R&d Center Toshiba Corporation
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Yoshiki Masahiko
Material Analysis Group Corporate Research And Development Center Toshiba Corp.
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Schimizu Tatsuo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Kawakubo Takashi
Advanced Lsi Technology Laboratory R&d Center Toshiba Corporation
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Yoshiki Masahiko
Material Analysis Group, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Kawakubo Takashi
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Sano Kenya
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Schimizu Tatsuo
Advanced LSI Technology Laboratory, Corporate Research and Development Center, Toshiba Corp., 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
著作論文
- Growth of Epitaxial SrTiO_3 on Epitaxial(Ti, Al)N/Si(100)Substrate Using Ti-Buffer Layer(Special Issue on Nonvolatile Memories)
- Electrical Properties and Thermodynamic Stability of Sr(Ti1-x,Rux)O3 Thin Films Deposited by Inductive-Coupling-Plasma-Induced RF Magnetron Sputtering