Endoh Tetsuo | Research Institute Of Electrical Communication Tohoku University

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Evaluation of the Voltage Down Converter(VDC)with Low Ratio of consuming Current to Load Current in DC/AC Operation Mode
Hydrogen-Controlled Crystallinity of 3C-SiC Film on Si(001) Grown with Monomethylsilane
Ge-Dot Formation on Si(111)-7 × 7 Surface with C Predeposition Using Monomethylsilane
High-Performance Buried-Gate Surrounding Gate Transistor for Future Three-Dimensional Devices
An Analysis of Program and Erase Mechanisms for Floating Channel Type Surrounding Gate Transistor Flash Memory Cells(Semiconductor Materials and Devices)
New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond
Buried Gate Type SGT Flash Memory(The IEICE Transactions (published in Japanese) Vol. J86-C, No.5 (Electronics))
Influence of Silicon Wafer Loading Ambient on Chemical Composition and Thickness Uniformity of Sub-5-nm-Thick Oxide Films : Surfaces, Interfaces, and Films
The Analysis of the Stacked-Surrounding Gate Transistor(S-SGT)DRAM for the High Speed and Low Voltage Operation
New Write/Erase Operation Technology for Flash EEPROM Cells to Improve the Read Disturb Characteristics
New Reduction Mechanism of the Stress Leakage Current Based on the Deactivation of Step Tunneling Sites for Thin Oxide Films
An Analytic Steady-State Current-Voltage Characteristics of Short Channel Fully-Depleted Surrounding Gate Transistor (FD-SGT) (Special Issue on New Concept Device and Novel Architecture LSIs)
An Accurate Model of Fully-Depleted Surrounding Gate Transistor (FD-SGT) (Special Issue on New Concept Device and Novel Architecture LSIs)
Physical Origin of Stress-Induced Leakage Currents in Ultra-Thin Silicon Dioxide Films(Ultra-Thin Gate Insulators,Fundamentals and Applications of Advanced Semiconductor Devices)
Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator(Novel MOSFET Structures,Fundamentals and Applications of Advanced Semiconductor Devices)
Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source
Study of Self-Heating in Si Nano Structure for Floating Body-Surround Gate Transistor with High-$k$ Dielectric Films
New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond

もっと見る

スポンサーリンク