Endoh Tetsuo | Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

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概要

• Endoh Tetsuoの詳細を見る
• 同名の論文著者
• Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japanの論文著者

関連著者

• Endoh Tetsuo

  Research Institute Of Electrical Communication Tohoku University

• Endoh Tetsuo

  Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• Masuoka Fujio

  Research Institute Of Electrical Communication Tohoku University

• KINOSHITA Kazushi

  Advanced Technology Development Center, Sharp Corporation

• YOKOYAMA Takashi

  Research Institute of Electrical Communication, Tohoku University

• Sakuraba Hiroshi

  Research Institute Of Electrical Communication Tohoku University

• Horii Shinji

  Research Institute Of Electrical Communication Tohoku University

• Tanigami Takuji

  Advanced Technology Development Center Sharp Corporation

• Sakiyama Keizou

  Advanced Technology Development Center Sharp Corporation

• Saitoh Masahiro

  Advanced Technology Development Center Sharp Corporation

• Tanaka Kousuke

  Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• Masuoka Fujio

  Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• Yokoyama Takashi

  Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• Sakuraba Hiroshi

  Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• Saitoh Masahiro

  Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan

• Kinoshita Kazushi

  Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan

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著作論文

• Study of Self-Heating in Si Nano Structure for Floating Body-Surround Gate Transistor with High-$k$ Dielectric Films
• New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond

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