KINOSHITA Kazushi | Advanced Technology Development Center, Sharp Corporation
スポンサーリンク
概要
関連著者
-
Endoh Tetsuo
Research Institute Of Electrical Communication Tohoku University
-
KINOSHITA Kazushi
Advanced Technology Development Center, Sharp Corporation
-
YOKOYAMA Takashi
Research Institute of Electrical Communication, Tohoku University
-
SAKURABA Hiroshi
Research Institute of Electrical Communication, Tohoku University
-
MASUOKA Fujio
Research Institute of Electrical Communication, Tohoku University
-
Masuoka F
Tohoku Univ. Sendai Jpn
-
Masuoka Fujio
Research Institute Of Electrical Communication Tohoku University
-
TANIGAMI Takuji
Advanced Technology Development Center, Sharp Corporation
-
HORII Shinji
Research Institute of Electrical Communication, Tohoku University
-
SAITOH Masahiro
Advanced Technology Development Center, Sharp Corporation
-
SAKIYAMA Keizou
Advanced Technology Development Center, Sharp Corporation
-
Sakuraba Hiroshi
Research Institute Of Electrical Communication Tohoku University
-
Horii Shinji
Research Institute Of Electrical Communication Tohoku University
-
Tanigami Takuji
Advanced Technology Development Center Sharp Corporation
-
Sakiyama Keizou
Advanced Technology Development Center Sharp Corporation
-
Saitoh Masahiro
Advanced Technology Development Center Sharp Corporation
-
Masuoka Fujio
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
Yokoyama Takashi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
Sakuraba Hiroshi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
Endoh Tetsuo
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
-
Saitoh Masahiro
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
-
Kinoshita Kazushi
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
著作論文
- New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond
- New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond