YOKOYAMA Takashi | Research Institute of Electrical Communication, Tohoku University
スポンサーリンク
概要
関連著者
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Endoh Tetsuo
Research Institute Of Electrical Communication Tohoku University
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KINOSHITA Kazushi
Advanced Technology Development Center, Sharp Corporation
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YOKOYAMA Takashi
Research Institute of Electrical Communication, Tohoku University
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SAKURABA Hiroshi
Research Institute of Electrical Communication, Tohoku University
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MASUOKA Fujio
Research Institute of Electrical Communication, Tohoku University
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Masuoka F
Tohoku Univ. Sendai Jpn
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Masuoka Fujio
Research Institute Of Electrical Communication Tohoku University
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TANIGAMI Takuji
Advanced Technology Development Center, Sharp Corporation
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HORII Shinji
Research Institute of Electrical Communication, Tohoku University
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SAITOH Masahiro
Advanced Technology Development Center, Sharp Corporation
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SAKIYAMA Keizou
Advanced Technology Development Center, Sharp Corporation
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Sakuraba Hiroshi
Research Institute Of Electrical Communication Tohoku University
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Horii Shinji
Research Institute Of Electrical Communication Tohoku University
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Tanigami Takuji
Advanced Technology Development Center Sharp Corporation
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Sakiyama Keizou
Advanced Technology Development Center Sharp Corporation
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Saitoh Masahiro
Advanced Technology Development Center Sharp Corporation
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Masuoka Fujio
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Yokoyama Takashi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Sakuraba Hiroshi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Endoh Tetsuo
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Saitoh Masahiro
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
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Kinoshita Kazushi
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
著作論文
- New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond
- New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond