Masuoka Fujio | Research Institute Of Electrical Communication Tohoku University
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概要
関連著者
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Masuoka Fujio
Research Institute Of Electrical Communication Tohoku University
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MASUOKA Fujio
Research Institute of Electrical Communication, Tohoku University
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Endoh Tetsuo
Research Institute Of Electrical Communication Tohoku University
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Masuoka F
Tohoku Univ. Sendai Jpn
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Masuoka Fujio
The Reserch Institute Of Electrical Communication Tohoku University
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Masuoka F
Research Institute Of Electrical Communication Tohoku University
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Endoh T
Tohoku Univ. Sendai‐shi Jpn
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Endoh T
Tohoku Univ. Sendai Jpn
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Endoh T
Research Institute Of Electrical Communication Tohoku University
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Sakuraba Hiroshi
Research Institute Of Electrical Communication Tohoku University
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SAKURABA Hiroshi
Research Institute of Electrical Communication, Tohoku University
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Yamamoto Yasue
System Lsi Technology Development Center Corporate System Lsi Development Division Semiconductor Com
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Yamamoto Yasue
Research Institute Of Electrical Communication Tohoku University
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NAKAMURA Tairiku
Research Institute of Electrical Communication, Tohoku University
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IWAI Makoto
Research Institute of Electrical Communication Tohoku University
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IIZUKA Hirohisa
Microelectronics Engineering Lab. Toshiba
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NAKAMURA Tomonori
Tohoku University
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Nakamura Tairiku
Research Institute Of Electrical Communication Tohoku University
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Hidaka Takeshi
Research Institute Of Electrical Communication Tohoku University
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Nakamura T
Department Of Bioengineering And Robotics Tohoku University
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Iizuka Hirohisa
Toyota Central Research & Development Labs. Inc.
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Nakamura Hiroki
Research Institute Of Electrical Communication Tohoku University
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NAKAMURA HIROKI
Research Division, Hitachi Plant Engineering & Construction Corporation
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Yamamoto Yasue
System Lsi Technology Development Center Corporate System Lsi Division Semiconductor Company Matsush
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HIDAKA Takeshi
Research Institute of Electrical Communication, Tohoku University
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NAKAMURA Hiroki
Research Institute of Electrical Communication, Tohoku University
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WATANABE Shunji
Nikon Corporation
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NAKAMURA Kazutoshi
Research Institute of Electrical Communication, Tohoku University
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NISHI Ryohsuke
Research Institute of Electrical Communication Tohoku University
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SHIROTA Riichirou
Microelectronics Engineering Lab. Toshiba
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SHIMIZU Kazuyosi
Microelectronics Engineering Lab. Toshiba
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Watanabe Souichi
The Niigata Institute Of Technology
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KINOSHITA Kazushi
Advanced Technology Development Center, Sharp Corporation
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YOKOYAMA Takashi
Research Institute of Electrical Communication, Tohoku University
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Shirota Riichiro
Microelectronics Engineering Lab. Toshiba
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Nakamura Kazutoshi
Division Of Social And Environmental Medicine Department Of Community Preventive Medicine Niigata Un
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Nakamura Kazutoshi
The Reserch Institute Of Electrical Communication Tohoku University
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Shirota Riichiro
Toshiba Research And Development Center Ulsi Research Laboratories
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Horii Shinji
Research Institute Of Electrical Communication Tohoku University
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Matsunaga Jun'ichi
Microelectronics Engineering Laboratory Toshiba Corporation
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Tanigami Takuji
Advanced Technology Development Center Sharp Corporation
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Sakiyama Keizou
Advanced Technology Development Center Sharp Corporation
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Kimura Y
Research Institute Of Electrical Communication Tohoku University
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Watanabe S
Fujitsu Lab. Ltd. Kawasaki‐shi Jpn
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OOWAKI Yukihito
Research amp Development Center, ULSI Research Laboratories, Toshiba Corporation
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OHUCHI Kazunori
Research amp Development Center, ULSI Research Laboratories, Toshiba Corporation
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Oowaki Yukihito
Toshiba Research and Development Center, ULSI Laboratories
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Mabuchi Keiji
Toshiba Research and Development Center, ULSI Laboratories
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Watanabe Shigeyoshi
Toshiba Research and Development Center, ULSI Laboratories
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Ohuchi Kazunori
Toshiba Research and Development Center, ULSI Laboratories
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Oowaki Yukihito
Research Amp Development Center Ulsi Research Laboratories Toshiba Corporation
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Oowaki Yukihito
Toshiba Corporation
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Ohuchi Kazunori
Research Amp Development Center Ulsi Research Laboratories Toshiba Corporation
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Saitoh Masahiro
Advanced Technology Development Center Sharp Corporation
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Kimura Yasutaka
Research Institute Of Electrical Communication Tohoku University
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Lenski Markus
Research Institute Of Electrical Communication Tohoku University
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Mabuchi Keiji
Toshiba Research And Development Center Ulsi Laboratories
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ENDOH Tetsuo
Research Institute of Electrical Communication, Tohoku University
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Izumida Takashi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Masuoka Fujio
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Yokoyama Takashi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Ohba Takuya
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Sakuraba Hiroshi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kitagawa Takeyuki
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Amikawa Hiroyuki
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Ohtsu Syuuhei
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Endoh Tetsuo
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Hidaka Takeshi
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Saitoh Masahiro
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
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Kinoshita Kazushi
Advanced Technology Development Center, Sharp Corporation, 1 Asahi, Daimon-cho, Fukuyama, Hiroshima 721-8522, Japan
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Nakamura Hiroki
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
著作論文
- Decananometer Surrounding Gate Transistor (SGT) Scalability by Using an Intrinsically-Doped Body and Gate Work Function Engineering(Semiconductor Materials and Devices)
- Evaluation of the Voltage Down Converter(VDC)with Low Ratio of consuming Current to Load Current in DC/AC Operation Mode
- High-Performance Buried-Gate Surrounding Gate Transistor for Future Three-Dimensional Devices
- Buried Gate Type SGT Flash Memory(The IEICE Transactions (published in Japanese) Vol. J86-C, No.5 (Electronics))
- Influence of Silicon Wafer Loading Ambient on Chemical Composition and Thickness Uniformity of Sub-5-nm-Thick Oxide Films : Surfaces, Interfaces, and Films
- New Write/Erase Operation Technology for Flash EEPROM Cells to Improve the Read Disturb Characteristics
- New Reduction Mechanism of the Stress Leakage Current Based on the Deactivation of Step Tunneling Sites for Thin Oxide Films
- An Analytic Steady-State Current-Voltage Characteristics of Short Channel Fully-Depleted Surrounding Gate Transistor (FD-SGT) (Special Issue on New Concept Device and Novel Architecture LSIs)
- An Accurate Model of Fully-Depleted Surrounding Gate Transistor (FD-SGT) (Special Issue on New Concept Device and Novel Architecture LSIs)
- New α-Particle Induced Soft Error Mechanism in a Three Dimensional Capacitor Cell
- Fabrication of Nanometer Silicon Pillars for Buried-Gate-Type Surrounding Gate Transistor by Silicon Quasi-Isotropic Etching
- New Three-Dimensional High-Density Stacked-Surrounding Gate Transistor (S-SGT) Flash Memory Architecture Using Self-Aligned Interconnection Fabrication Technology without Photolithography Process for Tera-Bits and Beyond