ENDOH Tetsuo | Research Institute of Electrical Communication, Tohoku University
スポンサーリンク
概要
関連著者
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Endoh Tetsuo
Research Institute Of Electrical Communication Tohoku University
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ENDOH Tetsuo
Research Institute of Electrical Communication, Tohoku University
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Shiraishi Kenji
Graduate School of Pure and Applied Science, University of Tsukuba
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Masuoka Fujio
Research Institute Of Electrical Communication Tohoku University
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Hirose Kazuyuki
Institute Of Space And Astronautical Science Jaxa
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Hirose Kazuyuki
Institute Of Space And Astronautical Science
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Kimura Y
Research Institute Of Electrical Communication Tohoku University
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Kimura Yasutaka
Research Institute Of Electrical Communication Tohoku University
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Lenski Markus
Research Institute Of Electrical Communication Tohoku University
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Shiraishi Kenji
Graduate School Of Pure & Applied Physics University Of Tsukuba
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Shiraishi Kenji
Graduate School Of Applied Physics Univ Of Tsukuba
著作論文
- Influence of Silicon Wafer Loading Ambient on Chemical Composition and Thickness Uniformity of Sub-5-nm-Thick Oxide Films : Surfaces, Interfaces, and Films
- Physical Origin of Stress-Induced Leakage Currents in Ultra-Thin Silicon Dioxide Films(Ultra-Thin Gate Insulators,Fundamentals and Applications of Advanced Semiconductor Devices)