Asai Yuhki | Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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概要
- Asai Yuhkiの詳細を見る
- 同名の論文著者
- Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japanの論文著者
関連著者
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Nakazawa Hideki
Faculty Of Science And Technology Hirosaki University
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Asai Yuhki
Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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Mashita Masao
Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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Mashita Masao
Faculty of Science and Technology, Hirosaki University
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Endoh Tetsuo
Research Institute Of Electrical Communication Tohoku University
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Suemitsu Maki
Center For Interdisciplinary Research Tohoku University
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Konno Atsushi
Center For Interdisciplinary Research Tohoku University
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Enta Yoshiharu
Faculty Of Science And Technology Hirosaki University
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Abe Toshimi
Tohoku Institute Of Technology
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Yasui Kanji
Nagaoka Univ. Technol. Nagaoka‐shi Jpn
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Itoh Takashi
Center For Information And Sciences Nippon Medical School
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Kinoshita Takeshi
Faculty Of Engineering Yamaguchi University
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Suemitsu Maki
Center of Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan
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Katoh Shigeki
Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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Narita Yuzuru
Kyusyu Institute of Technology, Kitakyusyu 804-8550, Japan
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Narita Yuzuru
Kyusyu Institute of Technology, Kitakyushu 804-8550, Japan
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Enta Yoshiharu
Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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Nakazawa Hideki
Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan
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Konno Atsushi
Center of Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan
著作論文
- Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source
- Effects of Substrate Bias Voltage on Structural, Mechanical and Tribological Properties of Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Methane and Argon Gases