Nakazawa Hideki | Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

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概要

• Nakazawa Hidekiの詳細を見る
• 同名の論文著者
• Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japanの論文著者

関連著者

• Nakazawa Hideki

  Faculty Of Science And Technology Hirosaki University

• Nakazawa Hideki

  Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Mashita Masao

  Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Mashita Masao

  Faculty of Science and Technology, Hirosaki University

• TAKATA Masasuke

  Nagaoka University of Technology

• Suemitsu Maki

  Center For Interdisciplinary Research Tohoku University

• ITO Takashi

  Center for Information and Sciences, Nippon Medical School

• FUKADA Yusuke

  Nagaoka University of Technology

• Akahane Tadashi

  Nagaoka Univ. Technol. Nagaoka‐shi Jpn

• Yasui Kanji

  Nagaoka Univ. Technol. Nagaoka‐shi Jpn

• Asai Yuhki

  Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Katoh Shigeki

  Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Narita Yuzuru

  Kyusyu Institute of Technology, Kitakyushu 804-8550, Japan

• Kuroki Yuichiro

  Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

• Kudo Masahiro

  Faculty of Science and Technology, Hirosaki University, Hirosaki, Aomori 036-8561, Japan

• Endou Tetsuro

  Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan

• Ito Takashi

  Center of Interdisciplinary Research, Tohoku University, Sendai 980-8578, Japan

• Fukada Yusuke

  Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

• Akahane Tadashi

  Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan

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著作論文

• Growth of GaN Films by Hot-Mesh Chemical Vapor Deposition Using Ruthenium-Coated Tungsten Mesh
• Effects of Substrate Bias Voltage on Structural, Mechanical and Tribological Properties of Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Methane and Argon Gases
• Comparison of Film Properties between Hydrogenated and Unhydrogenated Diamond-Like Carbon Films Prepared by Radio-Frequency Magnetron Sputtering

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