Working Pressure Effects on Deposition of Large-Area Microcrystalline Silicon Films on Flexible Plastic Substrate at 130℃ : Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-09-15
著者
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Wada T
Department Of Materials Chemistry Ryukoku University
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Wada T
Ryukoku Univ. Otsu Jpn
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Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Takano A
Fuji Electric Corp. Res. And Dev. Ltd. Kanagawa Jpn
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Takano Akihiro
Fuji Electric Corporate Research And Development Ltd.
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Takano Akihiro
Fuji Electric Advanced Technology Co. Ltd.
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Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Yoshida T
Nagoya Univ. Nagoya Jpn
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Yoshida T
Matsushita Electric Co. Tochigi Jpn
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Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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SHIMOSAWA Makoto
Fuji Electric Corporate Research and Development, Ltd.
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WADA Takehito
Fuji Electric Corporate Research and Development, Ltd.
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FUJIKAKE Shinji
Fuji Electric Corporate Research and Development, Ltd.
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YOSHIDA Takashi
Fuji Electric Corporate Research and Development, Ltd.
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Yoshida Takashi
Tsukuba Primate Center For Medical Science National Institute Of Infectious Diseases
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Takano A
Fuji Electric Corporate Research And Development Ltd.
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Fujikake Shinji
Fuji Electric Corporate Research And Development Ltd.
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Shimosawa Makoto
Fuji Electric Corporate Research And Development Ltd.
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