Preparation of Conductive and Transparent Thin Films by Argon Ion Beam Sputtering of Zinc Oxide in Atmosphere Containing Hydrogen
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-15
著者
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WADA Takahiro
Central Research Laboratories Matsushita Electric Industry Co., Ltd.
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Nishitani M
Matsushita Electric Ind. Co. Ltd. Kyoto Jpn
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Nishitani M
Matsushita Electric Industrial Co. Moriguchi Jpn
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Nishitani Mikihiko
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Nishitani Mikihiko
Central Research Laboratories Matsushita Electric Ind. Co. Ltd.
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Wada T
Department Of Materials Chemistry Ryukoku University
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Wada T
Ryukoku Univ. Otsu Jpn
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Wada Takao
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology
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Kohiki S
Kyushu Inst. Of Technol. Kitakyushu Jpn
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Kohiki Shigemi
Faculty Of Engineering Kyushu Institute Of Technology
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Kohiki Shigemi
Kochi National College Of Technology
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Wada T
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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Kohiki Shigemi
Department Of Materials Science Kyusyu Institute Of Technology
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Wada T
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Wada Takahiro
Central Research Laboratories Matsushita Electric Industrial Co. Ltd.
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