Observation of Ellipsometric Oscillations when Depositing SiO_x Film on Si(100) Substrate Using an Electron Beam Deposition Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-06-15
著者
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Yoshida T
Department Of Electronic Engineering Faculty Of Engineering Takushoku University
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Yoshida T
Matsushita Electric Co. Tochigi Jpn
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YOSHIOKA Yoshifumi
Technology Research Laboratory, Shimadzu Corporation
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HASHIMOTO Toyoyuki
Technology Research Laboratory, Shimadzu Corporation
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HISAMITSU Mamoru
Technology Research Laboratory, Shimadzu Corporation
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OHTANI Fumihiko
Technology Research Laboratory, Shimadzu Corporation
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YOSHIDA Tamio
Technology Research Laboratory, Shimadzu Corporation
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Ohtani Fumihiko
Technology Research Laboratory Shimadzu Corporation
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Yoshida T
Fukuoka Univ. Fukuoka Jpn
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Yoshida Tamio
Technology Research Laboratory Shimadzu Corporation
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Hisamitsu Mamoru
Technology Research Laboratory Shimadzu Corporation
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Yoshioka Yoshifumi
Technology Research Laboratory Shimadzu Corporation
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Hashimoto Toyoyuki
Technology Research Laboratory Shimadzu Corporation
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