A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2001-11-15

著者

• Yamashita Masahiro

  Department Of Bioengineering Tokyo Institute Of Technology

• SAITO Kyoichi

  Department of Materials Technology, Faculty of Engineering, Chiba University

• Saito K

  Department Of Materials Technology Chiba University

• Saito Kyoichi

  Department Of Applied Chemistry And Biotechnology Chiba University

• Higaki K

  Sumitomo Electric Ind. Ltd. Hyogo Jpn

• Liew Chan

  Department Of Materials Technology Chiba University

• KUSHIDA Masahito

  Department of Materials Technology, Faculty of Engineering, Chiba University

• HARADA Kieko

  Department of Materials Technology, Faculty of Engineering, Chiba University

• SUGITA Kazuyuki

  Department of Materials Technology, Faculty of Engineering, Chiba University

• Harada K

  Department Of Computer Science Kitami Institute Of Technology

• SUGITA Kazuyuki

  Graduate School of Science and Technology, Chiba University

• Kushida M

  Department Of Materials Technology Chiba University

• Sugita K

  Faculty Of Pharmaceutical Sciences University Of Tokyo

• Sugita Kazuyuki

  Department Of Image Science And Engineering Chida University

• Harada K

  Department Of Materials Technology Chiba University

• Kushida Masahito

  Department Of Electrical Engineering Kanagawa University

• Harada Kieko

  Department of Materials Technology, Faculty of Engineering, Chiba Univercity, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan

• Sugita Kazuyuki

  Department of Graphic Engineering, Faculty of Engineering, Chiba University

• Harada Kieko

  Department of Image Science and Engineering, Faculty of Engineering, Chiba University

• Harada Kieko

  Department of Computer Science, Kitami Institute of Technology

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