Low Temperature (≤550℃) Fabrication of CMOS TFT's on Rapid-Thermal CVD Polycrystalline Silicon-Germanium Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-03-30
著者
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Kim O
Pohang Univ. Sci. And Technol. Kyungbuk Kor
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Kim Ohyun
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Kim O
Pohang Univ. Of Science And Technology
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Chung Wook-jin
Research Institute Of Industrial Science And Technology
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Lee S‐k
Lg Chem Ltd. Daejeon Kor
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Kwon Y‐k
Hanyang Univ. Kyunggido Kor
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Ahn C‐g
Electronics And Telecommunications Res. Inst. Daejon Kor
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Ahn Chang-geun
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Ahn Chang-geun
Department Of Electrical Engineering Pohang University Of Science And Technology
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Kim Ohyun
Department Of Electrical And Electronic Engineering
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LEE Seo-Kyu
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology (PO
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Lee S‐k
Korea Advanced Inst. Sci. And Technol. Taejon Kor
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CHOE Seong-Min
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology
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KWON Young-Kyu
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology
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KANG Bong-Koo
Department of Electronic and Electrical Engineering, Pohang University of Science and Technology
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Lee Seo-kyu
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Choe Seong-min
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Kang Bong-koo
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Kwon Young-Kyu
Department of Elecronics, Uiduk University
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