Dose and Shape Modification Proximity Effect Correction for Forward-Scattering Range Scale Features in Electron Beam Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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Kim Ohyun
Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology
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Kim Ohyun
Department Of Electrical And Electronic Engineering Postech
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Kim Ohyun
Department Of Electrical And Electronic Engineering
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SEO Eunsung
Department of Electrical and Electronic Engineering
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Seo Eunsung
Department Of Electrical And Electronic Engineering Postech
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