Characterization of Proximity Correction in 100-nm-Regime X-Ray Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-12-30

著者

• Kim Ohyun

  Department Of Electronic And Electrical Engineering Pohang University Of Science And Technology

• Kim Ohyun

  Department Of Electrical And Electronic Engineering

• YI Moonsuk

  Department of Electrical and Electronic Engineering

• SEO Eunsung

  Department of Electrical and Electronic Engineering

• SEO Yongduck

  Department of Electrical and Electronic Engineering

• LEE Kyoungho

  Department of Electrical and Electronic Engineering

• Seo E

  Postech Kyungbuk Kor

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