Deposition Mechanism of a-Si:H Film in Disilane-Hydrogen Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1984-07-20

著者

• Nakata Y

  Graduate School Of Information Science And Electrical Engineering Kyushu University

• AKIYAMA Kensuke

  Kanagawa Industrial Technology Research Institute

• Kawamura Tatsuo

  Department Of Electrical Engineering Shibaura Institute Of Technology

• Nakayama Yoshikazu

  College Of Engineering University Of Osaka Prefecture

• Nakayama Yoshikazu

  College Of Engineering Graduate School Of Osaka Prefecture University

• Kawamura T

  Department Of Mathematics And Physics University Of Yamanashi

• Akiyama K

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Kawamura Takao

  Laboratory Of Plant Physiology Graduate School Of Agriculture Kyoto University:(present Address)sumi

• KAWAMURA Takao

  Colleage of Engineering, University of Osaka Prefecture

• Nakayama Y

  Univ. Tokyo Tokyo Jpn

• AKIYAMA Koji

  College of Engineering, University of Osaka Prefecture

• TAKUMA Yasuo

  College of Engineering, University of Osaka Prefecture

• OTSUCHI Tetsuro

  College of Engineering, University of Osaka Prefecture

• Takuma Yasuo

  College Of Engineering University Of Osaka Prefecture

• Otsuchi Tetsuro

  College Of Engineering University Of Osaka Prefecture

• Kawamura Takao

  Colleage Of Engineering University Of Osaka Prefecture

• Nakayama Yoshikazu

  Colleage Of Engineering University Of Osaka Prefecture

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