Low-Resistivity Highly Transparent Indium-Tin-Oxide Thin Films Prepared at Room Temperature by Synchrotron Radiation Ablation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-15
著者
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Nakata Y
Graduate School Of Information Science And Electrical Engineering Kyushu University
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KATOH Takanori
Sumitomo Heavy Industries, Ltd.
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Suzuki H
Solid State Division Hamamatsu Photonics K.k.
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Katoh T
Sumitomo Heavy Ind. Ltd. Tanashi Jpn
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Suzuki H
Meidensha Corp. Tokyo Jpn
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Suzuki Hisanori
Solid State Division Hamamatsu Photonics K.k.
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Nakayama Yoshikazu
College Of Engineering University Of Osaka Prefecture
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Miki H
Ritsumeikan University
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Imai S
Ritsumeikan University
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Katoh Takanori
Sumitomo Heavy Industries Ltd.
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AKAGI Yoshihiro
Ritsumeikan University
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HANAMOTO Katsumi
Ritsumeikan University
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SUZUKI Hiroyuki
Ritsumeikan University
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SASAKI Muneo
Industrial Research Center of Shiga Prefecture
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IMAI Shigeru
Ritsumeikan University
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TSUDAGAWA Masaru
Ritsumeikan University
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NAKAYAMA Yasuyuki
Ritsumeikan University
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MIKI Hidejiro
Ritsumeikan University
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Nakayama Y
Univ. Tokyo Tokyo Jpn
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