Metal (CoSi_2)/Insulator (CaF_2) Hot Electron Transistor Fabricated by Electron-Beam Lithography on a Si Substrate
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-10-01
著者
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Kohno Yoshifumi
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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WATANABE Masahiro
Department of Information Processing, Tokyo Institute of Technology
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Asada Masahiro
Department of Neurosurgery, Chibune Hospital
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Asada Masahiro
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito W
Tokyo Inst. Technol. Tokyo Jpn
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Saito Wataru
Institute Of Agriculture And Forestry University Of Tsukuba
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SAITOH Wataru
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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SUEMASU Takashi
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Saitoh Wataru
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Saito W
Toshiba Corp. Kawasaki Jpn
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Suemasu Takashi
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Watanabe Masahiro
Department Of Anatomy Hokkaido University School Of Medicine
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Watanabe Masahiro
Department Of Agricultural Chemistry Faculty Of Agriculture The University Of Tokyo
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