Electrical Evaluation of Sidewall Damage Caused by CH_4/H_2 Reactive Ion Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-08-15
著者
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野口 祐二
Univ. Tokyo Tokyo Jpn
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Noguchi Yutaka
Department Of Machine Intelligence And System Engineering Intelligent System Design Laboratory Tohok
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Kondo S
Dep. Electronic Engineering Sendai Jpn
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Yamamoto M
Osaka Univ. Suita‐shi Jpn
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KISHI Kenji
NTT Opto-electronics Laboratories
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KONDO Susumu
NTT Opto-electronics Laboratories
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NOGUCHI Yoshio
NTT Opto-electronics Laboratories
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Yamamoto M
Nihon University Graduate School Of Dentistry At Matsudo Clinical Pathology:department Of Oral Medic
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Yamamoto Mitsuo
Ntt Electronics Corporation
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Kondo S
Ntt Photonics Laboratories
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Kishi Kenji
Ntt Opto-elecronics Laborarories
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YUDA Masahiro
NTT Opto-elecronics Laborarories
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Yamamoto M
Nihon Univ. School Of Dentistry At Matsudo Chiba Jpn
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Yuda M
Yonago National Coll. Technol. Tottori
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