Automatic Defect Pattern Detection on LSI Wafers Using Image Processing Techniques
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概要
- 論文の詳細を見る
This paper describes a defect detection method which automatically extracts defect information from complicated background LSI patterns. Based on a scanning electron microscope (SEM) image, the defects on the wafer are characterized in terms of their locations, sizes and the shape of defects. For this purpose, two image processing techniques, the Hough transform and wavelet transform, have been employed. Especially, the Hough Transform for circles is applied to non-circulard efects for estimating the shapes of defects. By experiments, it has been demonstrated that the system is very effective in defect identification and will be used as an integral part in future tutomatic defect pattern cla,ssification systems.
- 社団法人電子情報通信学会の論文
- 1999-06-25
著者
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SHIBATA Tadashi
Department of Physics,Faculty of Science,Osaka University
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Shibata Tadashi
Department Of Information And Communication Engineering The University Of Tokyo
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Maruo Kazuyuki
Advantest Laboratories Ltd.
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Shibata Tadashi
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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Ohmi Tadahiro
The Department Of Electronics Faculty Of Engineering Tohoku University
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YAMAGUCH Takahiro
ADVANTEST Laboratories Ltd.
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ICHIKAWA Masayoshi
ADVANTEST Laboratories Ltd.
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Shibata Tadashi
Department of Electrical Engineering and Information System, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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